FILTERED RESULTS
FILTERS
Ads Top
DARK MODE
CHART
MCap $2.7T +0.4%24h Vol $102.1B -7.4%Fear & Greed 63/100Alts Index 35/100
BTC.D 58.3% -0.1%Stable.D 10.0% 0%ETH.D 11.6% +0.1%Others.D 20.1% 0%
牛来$0.1360+74.38%STONK$0.2971+70.94%AI$0.2519+36.56%WLFI$0.0570+17.34%APEPE$0.00000167+15.65%MINA$0.1050+12.99%CASHCAT$0.1813+10.87%PROM$5.799+10.65%ETHFI$0.7239+10.48%JUP$0.2469+8.11%
LAPTOP$0.3526-54.09%FF$0.1493-9.56%AKE$0.0145-9.22%BP$0.5307-7.66%UAI$0.6693-6.85%ATOM$1.647-5.95%STABLE$0.0276-4.83%MARSCOIN$0.1204-4.65%DOT$1.042-4.58%MET$0.2385-4.17%
Top movers 24h
    Filters
      Coins
      Sentiment
      Impact
      Search
      FILTERED RESULTS

        

      Upgrade your plan
      Dashboard

      Samsung and ASML Expand Strategic Cooperation, Betting on High NA EUV and 12-Inch Photomask

      PANews, September 9 – According to the official website of lithography giant ASML, Samsung Electronics and ASML have announced an expanded strategic partnership to deepen collaboration in high numerical aperture (High NA) EUV lithography and advanced semiconductor manufacturing. Samsung will join an industry initiative to advance the next-generation 12-inch photomask platform for High NA EUV, upgrading from the traditional 6-inch format to improve fab productivity, reduce chip manufacturing costs, and eliminate stitching limitations. Leveraging its experience in memory and foundry, Samsung will work with industry partners to develop related photomask technology and infrastructure, and plans to introduce ASML’s High NA EUV into DRAM mass production for the first time by 2028, extending the DRAM process roadmap while simplifying processes and improving production efficiency.


      Source: PANews
      .

      Terra Founder Do Kwon Sentenced to 15 Years in Prison for Fraud