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      Jensen Huang Predicts China Will Achieve Advanced Lithography by 2030

      At the All-In Summit, Jensen Huang, CEO of NVIDIA, expressed confidence that China will develop its own advanced lithography systems by 2030. Huang emphasized that once the technology reaches maturity, China is well-positioned to leverage its strong mass production capabilities, suggesting that domestic equipment will soon be integrated into local wafer fabrication facilities.

      Huang's assessment contrasts sharply with that of Frank Rohmund, head of Zeiss Semiconductor, who recently indicated that it could take an additional 15 years for China to manufacture its own extreme ultraviolet (EUV) lithography machines. Zeiss is a key supplier of EUV optical systems for ASML, a leading manufacturer in the field. While the discussion at the summit focused on advanced lithography systems in general, Huang did not specify whether he was referring exclusively to EUV technology in his remarks.

      © 2026 KLEA News. All Rights Reserved. This article is provided for informational purposes only. It is not offered or intended to be used as legal, tax, investment, financial, or other advice.

      Source: KLEA News

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